Electron and photon induced metal diffusion in amorphous As sub(50)Se sub(50) thin films coated with two metal layers

Refractive index change caused by electrons and photons was measured in amorphous As sub(50)Se sub(50) thin films. Films were coated with Au, Ag, In and with their two-layer combinations. Diffraction gratings were written using electron beam lithography. The diffusion of metals was found to change d...

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Bibliographic Details
Published inOptics communications Vol. 193; no. 1-6; pp. 147 - 151
Main Authors Nordman, O, Nordman, N
Format Journal Article
LanguageEnglish
Published 15.06.2001
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Summary:Refractive index change caused by electrons and photons was measured in amorphous As sub(50)Se sub(50) thin films. Films were coated with Au, Ag, In and with their two-layer combinations. Diffraction gratings were written using electron beam lithography. The diffusion of metals was found to change depending on the timing of the UV-light exposure applied on the films. Sensitivity changes to electrons were found in Ag and Au coated two-layer structures. Sensitivity was dependent on the sequence of the coatings. Au and In two-layer structures instead were found to be almost insensitive to UV light. copyright 2001 Published by Elsevier Science B.V.
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ISSN:0030-4018