Sputter deposition of TiNi, TiNiPd and TiPd films displaying the two-way shape-memory effect

TiNi, TiNiPd and TiPd films exhibiting the one-way and two-way shape-memory effect have been prepared by d.c. magnetron sputtering onto unheated substrates followed by annealing and training processes. In the case of TiNi, films could be prepared showing the R-phase transition, the important feature...

Full description

Saved in:
Bibliographic Details
Published inSensors and actuators. A. Physical. Vol. A53; no. 1-3; pp. 434 - 439
Main Authors Quandt, E, Halene, C, Holleck, H, Feit, K, Kohl, M, Schlossmacher, P, Skokan, A, Skrobanek, K D
Format Journal Article
LanguageEnglish
Published 25.06.1995
Online AccessGet full text

Cover

More Information
Summary:TiNi, TiNiPd and TiPd films exhibiting the one-way and two-way shape-memory effect have been prepared by d.c. magnetron sputtering onto unheated substrates followed by annealing and training processes. In the case of TiNi, films could be prepared showing the R-phase transition, the important feature of which is its small hysteresis of about 1K. By the Ni-Pd substitution the transition temperatures (austenite/martensite finish temperatures) could be increased from 32 deg C/-38 deg C for the binary NiTi alloy to a maximum of 570 deg C/498 deg C for TiPd films. The films have been subject to further microstructuring for developing micro-actuators displaying the two-way shape-memory effect.
Bibliography:SourceType-Scholarly Journals-2
ObjectType-Conference Paper-1
content type line 23
SourceType-Conference Papers & Proceedings-1
ObjectType-Feature-2
ObjectType-Article-3
ISSN:0924-4247