Dielectric properties of Ge-Pb-O thin films obtained by rf sputtering

The sputtering conditions were varied to obtain GePb sub x O sub 2 sub + sub x thin films (0 < or =x < or =1.4). Study of local order by EXAFS showed the deposits were GeO sub 4 tetrahedra linked either by O vertices or through a Pb sup 2 sup + cation. Dielectric properties were determined.

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Published inMaterials research bulletin Vol. 28; no. 3; pp. 203 - 212
Main Authors Caperaa, C, Baud, G, Besse, J P, Jacquet, M
Format Journal Article
LanguageEnglish
Published 01.01.1993
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Abstract The sputtering conditions were varied to obtain GePb sub x O sub 2 sub + sub x thin films (0 < or =x < or =1.4). Study of local order by EXAFS showed the deposits were GeO sub 4 tetrahedra linked either by O vertices or through a Pb sup 2 sup + cation. Dielectric properties were determined.
AbstractList The sputtering conditions were varied to obtain GePb sub x O sub 2 sub + sub x thin films (0 < or =x < or =1.4). Study of local order by EXAFS showed the deposits were GeO sub 4 tetrahedra linked either by O vertices or through a Pb sup 2 sup + cation. Dielectric properties were determined.
Author Jacquet, M
Besse, J P
Baud, G
Caperaa, C
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Title Dielectric properties of Ge-Pb-O thin films obtained by rf sputtering
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