TiO sub 2 /SiO sub 2 multilayer insulating films for ELD's [electroluminescent devices]
Films were first deposited on glass substrates coated with ITO conducting film, then Al stripe electrodes were deposited on the dielectric. Breakdown strength decreased with Ti content but a max charge density occurred at 1 nm thickness.
Saved in:
| Published in | Journal of the Electrochemical Society Vol. 139; no. 4; pp. 1204 - 1206 |
|---|---|
| Main Authors | , , |
| Format | Journal Article |
| Language | English |
| Published |
01.01.1992
|
| Online Access | Get full text |
Cover
Loading…
| Summary: | Films were first deposited on glass substrates coated with ITO conducting film, then Al stripe electrodes were deposited on the dielectric. Breakdown strength decreased with Ti content but a max charge density occurred at 1 nm thickness. |
|---|---|
| Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 content type line 23 ObjectType-Feature-1 |
| ISSN: | 0013-4651 |