The formation of diffraction gratings by the deposition of SiO sub(2) colloidal microspheres

• Published in: Applied physics. A, Materials science & processing Vol. 122; no. 12; pp. 1 - 6
• Main Authors: Ashurov, MS, Kazakova, T A, Stepanov, AL, Klimonsky, SO
• Format: Journal Article
• Language: English
• Published: 01.12.2016
• Subjects: Colloids; Deposition; Diffraction gratings; Formations; Liquids; Microspheres; Ridges; Silicon dioxide
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-016-0593-7

A simple way of fabrication of diffraction gratings with the help of deposition of SiO sub(2) colloidal particles on vertical glass substrate has been proposed. The method is based on an intermittent, "stick-slip" motion of the suspension meniscus during liquid evaporation. The deposition was carried out at different temperatures (from 27 to 50 degree C). Ethanol-based suspensions with a SiO sub(2) concentration in the range of 0.2-0.83 g/L, both narrow-dispersed with SiO sub(2) particle diameter of about 200-300 nm and polydisperse, were used. As a result, the structures consisting of parallel ridges of deposited SiO sub(2) microspheres repeating with a period of 140-200 mu m and empty gaps between them have been prepared. The diffraction gratings formation is possible only at temperatures higher than the critical value of about 30 degree C, and their period enhances with the temperature increase. The real diffraction patterns of light have been obtained for such structures for the first time. Further modification of prepared structures with the purpose of their strengthening has been realized with the help of high-dose Ag super(+) implantation (4 10 super(16) ions/cm super(2), ion energy of 30 keV) followed by sonication.