Estimation of Self-ignited Plasma Density by N sub(2) Gas using Plasma-based Ion Implantation

Plasma density is estimated from the target voltage and current characteristics of the pulse modulator circuit in plasma-based ion implantation. The voltage recovery time constant directly reflects the ion sheath characteristics, and the sheath resistance is related to the ion density inside the tra...

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Bibliographic Details
Published inShinkū Vol. 57; no. 5; pp. 189 - 192
Main Authors Fujimura, Nobuyuki, Shimono, Kazuhiro, Noguchi, Hiromitsu, Toyota, Hiroshi, Shirai, Yoshito, Tanaka, Takeshi
Format Journal Article
LanguageJapanese
Published 01.01.2014
Subjects
Density
Electric potential
Equivalent circuits
Ion implantation
Modulators
Plasma density
Sheaths
Voltage
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Summary:Plasma density is estimated from the target voltage and current characteristics of the pulse modulator circuit in plasma-based ion implantation. The voltage recovery time constant directly reflects the ion sheath characteristics, and the sheath resistance is related to the ion density inside the transient sheath. The stationary current also provides information on the sheath parameters. The ion density obtained by equating the measured characteristics with an equivalent circuit can be converted to plasma density using a continuity equation. Thus, the plasma density is estimated can be controlled by the degree of vacuum and the applied voltage.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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ObjectType-Feature-1
ISSN:1882-2398
1882-4749
DOI:10.3131/jvsj2.57.189