Dual-Heater Reactor Design for Hybrid Physical-Chemical Vapor Deposition of 2 Thin Films

Computational fluid dynamics (CFD) based reactor modeling was used to simulate the gas flow, temperature and gas phase concentration profiles in the reactor in order to identify conditions suitable for film deposition.

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Bibliographic Details
Published inIEEE transactions on applied superconductivity Vol. 17; no. 2; p. 2862
Main Authors Lamborn, D.R, Wilke, R.H.T, Li, Q, Xi, X.X, Snyder, D.W, Redwing, J.M
Format Journal Article
LanguageEnglish
Published New York The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 01.05.2007
Subjects
Boron
Fluid dynamics
Growth rate
Surface chemistry
Temperature
Thin films
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Summary:Computational fluid dynamics (CFD) based reactor modeling was used to simulate the gas flow, temperature and gas phase concentration profiles in the reactor in order to identify conditions suitable for film deposition.
ISSN:1051-8223
1558-2515
DOI:10.1109/TASC.2007.897990