Preparation and Characterization of Nanostructured Manganese-Doped Zinc Oxide Thin Films
- By spray pyrolysis (SP) process, thin films of ZnO and (ZnO:Mn) with 1% and 3% concentrations were created at a temperature of 400 °C. According to XRD investigation, ZnO films are poly crystalline and have a cubic structure with a distinct peak in one direction (101). The grain size increases as...
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Published in | Journal of Electrical Systems Vol. 20; no. 9s; pp. 954 - 962 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Paris
Engineering and Scientific Research Groups
01.01.2024
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Subjects | |
Online Access | Get full text |
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Summary: | - By spray pyrolysis (SP) process, thin films of ZnO and (ZnO:Mn) with 1% and 3% concentrations were created at a temperature of 400 °C. According to XRD investigation, ZnO films are poly crystalline and have a cubic structure with a distinct peak in one direction (101). The grain size increases as manganese content rise, from 12.66 nm to 14.66 nm. While the strain () for ZnO reduced after manganese doping, it decreased from 27.36 to 23.63. Surface topography and nanostructure study reveal that as the manganese (Mn) content of ZnO films increased, cluster grain size, average roughness, and root mean square roughness (Rrms) all significantly reduced. The average transmittance was >70% in the visible area for Undoped ZnO and 1,3% Manganese doping optical transmittance demonstrates exceptional optical transparency. When doping levels are increased by 1% or 3%, the absorption coefficient rises.The optical band gap was decreased from (3.32 to 3.21) eV. Results illustrate that the films' refractive index and extinction coefficient decreases with increasing Tin Doped. |
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ISSN: | 1112-5209 |