Impact of geometry on chemical analysis exemplified for photoelectron spectroscopy of black silicon

For smooth surfaces, chemical composition can be readily analyzed using various spectroscopic techniques, a prominent example is X-ray photoelectron spectroscopy (XPS), where the relative proportions of the elements are mainly determined by the intensity ratio of the element-specific photoelectrons....

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Bibliographic Details
Published inarXiv.org
Main Authors Neurohr, Jens U, Wittig, Anton, Hähl, Hendrik, Nolle, Friederike, Faidt, Thomas, Grandthyll, Samuel, Jacobs, Karin, Klatt, Michael A, Müller, Frank
Format Paper
LanguageEnglish
Published Ithaca Cornell University Library, arXiv.org 10.10.2024
Subjects
Chemical analysis
Chemical composition
Chemical properties
Deduction
Electrons
Photoelectrons
Silicon
Spectrum analysis
Tensors
Thickness
X ray photoelectron spectroscopy
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Summary:For smooth surfaces, chemical composition can be readily analyzed using various spectroscopic techniques, a prominent example is X-ray photoelectron spectroscopy (XPS), where the relative proportions of the elements are mainly determined by the intensity ratio of the element-specific photoelectrons. However, this analysis becomes more complex for nanorough surfaces like black silicon (b-Si) due to the geometry's steep slopes, which mimic local variations in emission angles. In this study, we explicitly quantify this effect through an integral geometric analysis using Minkowski tensors, correlating XPS chemical data with topographical information from Atomic Force Microscopy (AFM). This approach yields reliable estimates of layer thicknesses for nanorough surfaces. For b-Si, we found that the oxide layer is approximately 50% thicker than the native oxide layer on a standard Si wafer. This study underscores the significant impact of nanoscale geometries on chemical property analysis.
ISSN:2331-8422