Automatic Parameter Selection for Electron Ptychography via Bayesian Optimization

Electron ptychography provides new opportunities to resolve atomic structures with deep sub-angstrom spatial resolution and studying electron-beam sensitive materials with high dose efficiency. In practice, obtaining accurate ptychography images requires simultaneously optimizing multiple parameters...

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Bibliographic Details
Published inarXiv.org
Main Authors Cao, Michael C, Chen, Zhen, Jiang, Yi, Han, Yimo
Format Paper
LanguageEnglish
Published Ithaca Cornell University Library, arXiv.org 25.04.2022
Subjects
Bayesian analysis
Electron beams
Gaussian process
Optimization
Parameters
Spatial resolution
Workflow
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Summary:Electron ptychography provides new opportunities to resolve atomic structures with deep sub-angstrom spatial resolution and studying electron-beam sensitive materials with high dose efficiency. In practice, obtaining accurate ptychography images requires simultaneously optimizing multiple parameters that are often selected based on trial-and-error, resulting in low-throughput experiments and preventing wider adoption. Here, we develop an automatic parameter selection framework to circumvent this problem using Bayesian optimization with Gaussian processes. With minimal prior knowledge, the workflow efficiently produces ptychographic reconstructions that are superior than the ones processed by experienced experts. The method also facilitates better experimental designs by exploring optimized experimental parameters from simulated data.
ISSN:2331-8422