FABRICATION OF POROUS SILICON WITH SILVER NANOPARTICLES BY ION IMPLANTATION

• Published in: Nanotechnology Research Journal Vol. 10; no. 1; pp. 57 - 70
• Main Authors: Stepanov, A L, Vorobev, V V, Nuzhdin, V I, Valeev, V F, Osin, Y N
• Format: Journal Article
• Language: English
• Published: Hauppauge Nova Science Publishers, Inc 01.01.2017
• Subjects: Chemical elements; Energy; Etching; Gases; Industrial applications; Ion implantation; Morphology; Nanoparticles; Noble metals; Photovoltaic cells; Porous silicon; Raman spectra; Scanning electron microscopy; Semiconductors; Sensors; Silicon wafers; Silver; Solar cells; Spectrum analysis; Visible spectrum

Porous silicon (PSi) have attracted remarkable concerns and found tremendous importance widespread in both fundamental research and industrial applications. At modern time PSi is considering as a key material in many industrial sectors such as electronics, sensors and photonics. Additionally, the interest to PSi nanostructures containing noble metal nanoparticles was recently found. Silver nanoparticles are the subject of specific increasing features due to their strongest plasmon resonance in the visible spectrum. Such materials could be widely used for variety applications as solar cells, absorbents, lightings, catalysts, and for biological sensors. At the present report a novel technological approach based on low-energy ion implantation is suggested and realized to create PSi layers with silver nanoparticles on the crystalline surface of Si wafers. It is demonstrated that using high-dose Ag-ion implantation of silicon with the energy of 30-60 keV the surface PSi structures with silver nanoparticles can be successfully fabricated. Also the fabricated plasmonic material - Ag:PSi is tested for Surface Enhanced Raman Scattering - SERS sensor application.