OpenMPL: An Open Source Layout Decomposer

Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the NP-hardness of the general decomposition problem, various efficient...

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Bibliographic Details
Published inarXiv.org
Main Authors Li, Wei, Ma, Yuzhe, Sun, Qi, Lin, Yibo, Iris Hui-Ru Jiang, Yu, Bei, Pan, David Z
Format Paper
LanguageEnglish
Published Ithaca Cornell University Library, arXiv.org 16.09.2019
Subjects
Algorithms
Decomposition
Electronic design automation
Integrated circuits
Layouts
State of the art
Very large scale integration
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Summary:Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the NP-hardness of the general decomposition problem, various efficient algorithms have been proposed with high quality solutions. However, with increasingly complicated design flow and peripheral processing steps, developing a high-quality layout decomposer becomes more and more difficult, slowing down the further advancement in this field. This paper presents OpenMPL [1], an open-source layout decomposition framework, with well-separated peripheral processing and the core solving steps. We demonstrate the flexibility of the framework with efficient implementations of various state-of-the-art algorithms, which enable us to reproduce most of the recent results on widely-recognized benchmarks. We believe OpenMPL can pave the road for developing layout decomposition engines and stimulate further researches on this problem.
ISSN:2331-8422