Ion assisted deposition of a-Al^sub 2^O^sub 3^ coatings by anodic evaporation in the arc discharge

Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the α-Al2O3 coatings, deposited on a stainless steel sub...

Full description

Saved in:
Bibliographic Details
Published inSurface & coatings technology Vol. 337; p. 453
Main Authors Gavrilov, NV, Kamenetskikh, AS, Tretnikov, PV, Chukin, AV
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier BV 15.03.2018
Subjects
Alumina
Aluminum oxide
Anodic coatings
Arc deposition
Coatings
Crystallization
Discharge
Electric arcs
Evaporation
Ion beam assisted deposition
Ion current density
Ion currents
Substrates
Online AccessGet full text

Cover

More Information
Summary:Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the α-Al2O3 coatings, deposited on a stainless steel substrate with an isostructural Cr2O3 sublayer at 600 °C, was studied.
ISSN:0257-8972
1879-3347