Ion assisted deposition of a-Al^sub 2^O^sub 3^ coatings by anodic evaporation in the arc discharge
Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the α-Al2O3 coatings, deposited on a stainless steel sub...
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Published in | Surface & coatings technology Vol. 337; p. 453 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier BV
15.03.2018
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Subjects | |
Online Access | Get full text |
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Summary: | Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the α-Al2O3 coatings, deposited on a stainless steel substrate with an isostructural Cr2O3 sublayer at 600 °C, was studied. |
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ISSN: | 0257-8972 1879-3347 |