Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S^sub 2^O^sub 8^^sup 2-^-Fe^sup 2+^ based slurry

• Published in: Tribology international Vol. 110; p. 441
• Main Authors: Shi, Xiaolei, Zou, Chunli, Pan, Guoshun, Gong, Hua, Xu, Li, Zhou, Yan
• Format: Journal Article
• Language: English
• Published: Kidlington Elsevier BV 01.06.2017
• Subjects: Additives; Catalysis; Chemical-mechanical polishing; Gallium nitride epitaxy; Gallium nitrides; Reagents; Slurries; Studies; Topography

In this paper, a significant improvement of chemical-mechanical polishing on gallium nitride with S2O82--Fe2+ based slurry is presented in detail. The results indicate that the S2O82--Fe2+ additives possessed obvious effect to enhance the polishing efficiency of GaN, and successfully achieved good s...