Single-wafer polysilicon engineering for the improvement of over erase in a 0.18-[micro]m floating-gate flash memory

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Bibliographic Details
Published inIEEE transactions on semiconductor manufacturing Vol. 16; no. 2; p. 155
Main Authors Luoh, Tuung, Han, Tzung-Ting, Yang, Yun-Chi, Chen, Kuang-Chao, Shih, Hsueh-Hao, Hwang, Yaw-Lin, Hsueh, Cheng-Chen, Chung, H, Pan, S, Lu, Chih-Yuan
Format Journal Article
LanguageEnglish
Published New York The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 01.05.2003
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ISSN:0894-6507
1558-2345
DOI:10.1109/TSM.2003.810937