Investigation of the thermal stability of nitrogen-rich amorphous carbon nitride films

• Published in: Thin solid films Vol. 377-78; pp. 148 - 155
• Main Authors: KULISCH, W, POPOV, C, ZAMBOV, L, BULIR, J, DELPLANCKE-OGLETREE, M. P, LANCOK, J, JELINEK, M
• Format: Conference Proceeding
• Language: English
• Published: Lausanne Elsevier Science 2000
• Subjects: Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Laser deposition; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physical properties of thin films, nonelectronic; Physics; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thermal stability; thermal effects; Raman spectra; Fourier transformation; Inorganic compounds; Laser deposition; Crystal growth from vapors; XRD; High temperature; Infrared spectra; Experimental study; Pulsed lasers; Photoelectron spectroscopy; Thermal stability; AES; Thickness; Nitrides; Ambient temperature; X radiation; Carbon nitrides; Chemical composition; Inductive coupling; PECVD; Thermal annealing
• ISSN: 0040-6090; 1879-2731