Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)

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Bibliographic Details
Published inSurface & coatings technology Vol. 133-34; pp. 555 - 560
Main Authors ZYWITZKI, Olaf, SAHM, Hagen, KRUG, Mario, MORGNER, Henry, NEUMANN, Manfred
Format Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier 2000
Subjects
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Thin films
Magnetrons
Silicon oxides
Physical vapor deposition
Reactive sputtering
Experimental study
Coatings
Sputtering
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ISSN:0257-8972
1879-3347