Composition, etching and optical properties of silicon nitride films deposited by plasma-enhanced chemical vapour deposition prepared in variable NH3-N2Gas mixture diluted with helium
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Published in | Thin solid films Vol. 203; no. 1; pp. 87 - 94 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier Science
1991
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Subjects | |
Online Access | Get full text |
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ISSN: | 0040-6090 1879-2731 |
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