FTIR in situd studies of the gas phase reactions in chemical vapor deposition of SiC

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 142; no. 7; pp. 2357 - 2362
Main Authors JONAS, S, PTAK, W. S, SADOWSKI, W, WALASEK, E, PALUSZKIEWICZ, C
Format Journal Article
LanguageEnglish
Published Pennington, NJ Electrochemical Society 1995
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Fourier transformation
Inorganic compounds
Semiconductor materials
In situ
Silicon carbides
Binary compounds
Chemical reactions
Crystal growth from vapors
Infrared spectra
Experimental study
CVD
Thin films
Surface reactions
Gaseous phase reaction
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ISSN:0013-4651
1945-7111