Experimental verifications of an aerial image evaluation method and its application to studies of attenuated phase-shifting masks

Saved in:
Bibliographic Details
Published inJapanese journal of applied physics Vol. 34; no. 12B; pp. 6598 - 6604
Main Authors SHIMIZU, H, UESAWA, F, ODA, T, SUGAWARA, M
Format Conference Proceeding
LanguageEnglish
Published Tokyo Japanese journal of applied physics 1995
Subjects
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Microelectronic fabrication
Experimental test
Simulation
Phase shift
Lithography
Theoretical study
Mask
Attenuation
Aerial photography
Photolithography
Online AccessGet full text

Cover

More Information
ISSN:0021-4922
1347-4065