Nanosecond laser ablation and deposition of silicon Photo-excited Processes and Applications

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Bibliographic Details
Published inApplied physics. A, Materials science & processing Vol. 104; no. 3; pp. 877 - 881
Main Authors WEE ONG SIEW, SEONG SHAN YAP, LADAM, Cécile, DAHL, Øystein, TURID WORREN REENAAS, TECK YONG TOU
Format Journal Article
LanguageEnglish
Published Heidelberg Springer 2011
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Atomic force microscopy
Scanning electron microscopy
Raman spectra
Amorphous thin film
Fluence
Surface morphology
Laser deposition
Polycrystals
Pulsed laser deposition
Raman spectroscopy
Substrat temperature
Thin films
Droplets
Laser ablation technique
Silicon
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ISSN:0947-8396
1432-0630