Development of X-shaped filtered-arc-deposition (X-FAD) apparatus and DLC/Cr film preparation Electrical discharges in vacuum
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Published in | IEEE transactions on plasma science Vol. 35; no. 4; pp. 1014 - 1019 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
New York, NY
Institute of Electrical and Electronics Engineers
2007
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Subjects | |
Online Access | Get full text |
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ISSN: | 0093-3813 1939-9375 |
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