Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography : Special cluster on extreme ultraviolet light sources for semiconductor manufacturing

Saved in:
Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 37; no. 23; pp. 3213 - 3224
Main Authors KRÜCKEN, Thomas, BERGMANN, Klaus, JUSCHKIN, Larissa, LEBERT, Rainer
Format Journal Article
LanguageEnglish
Published Bristol Institute of Physics 2004
Subjects
Exact sciences and technology
Intense particle beams and radiation sources
Magnetic confinement and equilibrium
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma devices for generation of coherent radiation
Theta pinch
Hollow cathodes
Electric discharges
Xenon
Theoretical study
Leakage currents
Plasma sources
Pinch devices
Ionization
Emission spectra
Radiation sources
Xenon ions
Ultraviolet lithography
Tin
Plasma magnetohydrodynamics
Extreme ultraviolet radiation
Online AccessGet full text

Cover

More Information
ISSN:0022-3727
1361-6463