Nano-cluster formation in halogen etching on Cl/Si(1 1 1)-7 × 7

Saved in:
Bibliographic Details
Published inSurface science Vol. 566-68; pp. 425 - 429
Main Authors SHUDO, K, KIRIMURA, T, KANEKO, N, TAKAHASHI, M, TANAKA, Y, ISHIKAWA, T, TANAKA, M, NAKAGAWA, H, ASAKURA, S
Format Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier Science 2004
New York, NY
Lausanne
Subjects
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Physics
Temperature dependence
Semiconductor devices
Chlorine
Desorption
Etching
Thermal desorption
Surface diffusion
Step
Time dependence
Scanning tunneling microscopy
Halogens
Clusters
Silicon
Nanostructured materials
Online AccessGet full text

Cover

More Information
ISSN:0039-6028
1879-2758