Dual radio frequency sources in a magnetized capacitively coupled plasma discharge Special issue on the modeling and simulation of collisional or near-collisionless low temperature plasmas

• Published in: IEEE transactions on plasma science Vol. 31; no. 4; pp. 471 - 478
• Main Author: RAUF, Shahid
• Format: Journal Article
• Language: English
• Published: New York, NY Institute of Electrical and Electronics Engineers 2003
• Subjects: Exact sciences and technology; Magnetohydrodynamic and fluid equation; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma heating (beam injection, radio-frequency and microwave, ohmic, icr, ecr and current drive heating); Plasma production and heating; Plasma properties; Plasma simulation; Plasma physics; Magnetoplasma; Magnetic field effects; Theoretical study; Harmonic generation; Plasma sheaths; Plasma fluid equations; Subharmonic; Reactive ion etching; Radial field; Modelling; Capacitive coupling; Argon; Carbon fluorides; Capacitive discharge
• ISSN: 0093-3813; 1939-9375