High rate and process control of reactive sputtering by gas pulsing : the Ti-O system
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Published in | Thin solid films Vol. 377-78; pp. 550 - 556 |
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Main Authors | , , , , |
Format | Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier Science
2000
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Subjects | |
Online Access | Get full text |
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ISSN: | 0040-6090 1879-2731 |
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