Extreme ultraviolet liithography capabilities at the advancedlight source using a 0.3-NA optic

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Bibliographic Details
Published inIEEE journal of quantum electronics Vol. 42; no. 1
Main Authors Naulleau, Patrick, Goldberg, Kenneth A., Cain, Jason P., Anderson, Erik H., Dean, Kim R., Denham, Paul, Hoef, Brian, Jackson,Keith H.
Format Journal Article
LanguageEnglish
Published United States 01.01.2006
Subjects
ADVANCED LIGHT SOURCE
EXTREME ULTRAVIOLET RADIATION
OPTICS
PARTICLE ACCELERATORS
Online AccessGet full text

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Author Goldberg, Kenneth A.
Cain, Jason P.
Jackson,Keith H.
Naulleau, Patrick
Dean, Kim R.
Hoef, Brian
Denham, Paul
Anderson, Erik H.
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  fullname: Dean, Kim R.
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  fullname: Denham, Paul
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  fullname: Hoef, Brian
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  fullname: Jackson,Keith H.
BackLink https://www.osti.gov/biblio/899738$$D View this record in Osti.gov
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CorporateAuthor Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
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SubjectTerms ADVANCED LIGHT SOURCE
EXTREME ULTRAVIOLET RADIATION
OPTICS
PARTICLE ACCELERATORS
Title Extreme ultraviolet liithography capabilities at the advancedlight source using a 0.3-NA optic
URI https://www.osti.gov/biblio/899738
Volume 42
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