Extreme ultraviolet liithography capabilities at the advancedlight source using a 0.3-NA optic

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Bibliographic Details
Published inIEEE journal of quantum electronics Vol. 42; no. 1
Main Authors Naulleau, Patrick, Goldberg, Kenneth A., Cain, Jason P., Anderson, Erik H., Dean, Kim R., Denham, Paul, Hoef, Brian, Jackson,Keith H.
Format Journal Article
LanguageEnglish
Published United States 01.01.2006
Subjects
ADVANCED LIGHT SOURCE
EXTREME ULTRAVIOLET RADIATION
OPTICS
PARTICLE ACCELERATORS
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Bibliography:LBNL-60356
DE-AC02-05CH11231
USDOE Director. Office of Science. Office of AdvancedScientific Computing Research. Office of Basic EnergySciences
ISSN:0018-9197
1558-1713
DOI:10.1109/JQE.2005.858450