Optimization of high B{sub sat} FeCo films for write pole applications

FeCo films and their lamination with ultrathin NiFe layers down to 5 A were deposited using dc magnetron sputtering techniques. Soft magnetic FeCo films were obtained at an optimal target power of 500 W and an optimal deposition pressure of 2 mTorr with high saturation flux density, B{sub sat}>2....

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Bibliographic Details
Published inJournal of applied physics Vol. 97; no. 10
Main Authors Mao Ming, Schneider, Thomas, Bubber, Randhir, Kools, Jacques, Liu Xubo, Altounian, Zaven, Lee, C.-L., Devasahayam, Adrian, Rook, Katrina, Physics Department, McGill University, Montreal, Quebec, H3A 2T8, Veeco Instruments Plainview, Plainview, New York 11803
Format Journal Article
LanguageEnglish
Published United States 15.05.2005
Subjects
BINARY ALLOY SYSTEMS
COBALT ALLOYS
COERCIVE FORCE
DEPOSITION
FERROMAGNETIC MATERIALS
FLUX DENSITY
LAYERS
MAGNETIC FLUX
MAGNETOSTRICTION
MATERIALS SCIENCE
OPTIMIZATION
PERMALLOY
SPUTTERING
STRESSES
SUBSTRATES
THICKNESS
THIN FILMS
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Summary:FeCo films and their lamination with ultrathin NiFe layers down to 5 A were deposited using dc magnetron sputtering techniques. Soft magnetic FeCo films were obtained at an optimal target power of 500 W and an optimal deposition pressure of 2 mTorr with high saturation flux density, B{sub sat}>2.4 T, and low easy-axis coercivity, H{sub ce}{<=}15 Oe, and hard-axis coercivity, H{sub ch}{<=}3 Oe, at a film thickness of 2000 A. While the magnetostriction remains at {approx}4x10{sup -6} the stress was further optimized by applying substrate bias at a controlled level {<=}50 V without sacrificing film magnetic softness.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1853951