Reliability Improvement and Effective Switching Layer Model of Thin‐Film MoS 2 Memristors

• Published in: Advanced functional materials
• Main Authors: Huang, Yifu, Gu, Yuqian, Mohan, Sivasakthya, Dolocan, Andrei, Ignacio, Nicholas D., Kutagulla, Shanmukh, Matthews, Kevin, Londoño‐Calderon, Alejandra, Chang, Yao‐Feng, Chen, Ying‐Chen, Warner, Jamie H., Pettes, Michael T., Lee, Jack C., Akinwande, Deji
• Format: Journal Article
• Language: English
• Published: Germany Wiley Blackwell (John Wiley & Sons) 13.04.2023
• ISSN: 1616-301X; 1616-3028

Abstract 2D memristors have demonstrated attractive resistive switching characteristics recently but also suffer from the reliability issue, which limits practical applications. Previous efforts on 2D memristors have primarily focused on exploring new material systems, while damage from the metallization step remains a practical concern for the reliability of 2D memristors. Here, the impact of metallization conditions and the thickness of MoS 2 films on the reliability and other device metrics of MoS 2 ‐based memristors is carefully studied. The statistical electrical measurements show that the reliability can be improved to 92% for yield and improved by ≈16× for average DC cycling endurance in the devices by reducing the top electrode (TE) deposition rate and increasing the thickness of MoS 2 films. Intriguing convergence of switching voltages and resistance ratio is revealed by the statistical analysis of experimental switching cycles. An “effective switching layer” model compatible with both monolayer and few‐layer MoS 2 , is proposed to understand the reliability improvement related to the optimization of fabrication configuration and the convergence of switching metrics. The Monte Carlo simulations help illustrate the underlying physics of endurance failure associated with cluster formation and provide additional insight into endurance improvement with device fabrication optimization.