Holographic Grating Erasing Characteristics byNon-polarized Beam in Amorphous Chalcogenide Thin Films
In the present work, we investigated the holographic grating erasing method by means of the optical method. It was formed the grating under the interference of holographic recording He-Ne laser beams on chalcogenide As40Ge10Se15S35 thin film with various film thickness and erased the holographic gra...
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| Published in | Transactions on electrical and electronic materials pp. 141 - 144 |
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| Main Authors | , , |
| Format | Journal Article |
| Language | Korean |
| Published |
한국전기전자재료학회
01.06.2006
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1229-7607 2092-7592 |
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| Summary: | In the present work, we investigated the holographic grating erasing method by means of the optical method. It was formed the grating under the interference of holographic recording He-Ne laser beams on chalcogenide As40Ge10Se15S35 thin film with various film thickness and erased the holographic grating by non-polarized He-Ne laser beam. As the results, the recording grating erased the 80 % of formed grating by non-polarized He-Ne laser beam. It was confirmed that the erasing characteristics by non-polarized laser beam need to improve the focusing of beam and the control of beam intensity. And then it can be expected as the application possibility of rewritable holographic memory technology. KCI Citation Count: 0 |
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| Bibliography: | G704-001065.2006.7.3.009 |
| ISSN: | 1229-7607 2092-7592 |