SiO_2 Nanodot Arrays Using Patterned Functionalization of Self-Assembled Block Copolymer and Selective Adsorption of Amine-Terminated Polydimethylsiloxane

• Published in: Macromolecular research pp. 891 - 896
• Main Authors: 김수민, 김진백, 구세진
• Format: Journal Article
• Language: English
• Published: 한국고분자학회 01.09.2011
• Subjects: 고분자공학
• ISSN: 1598-5032; 2092-7673

Silicon dioxide (SiO_2) nanodot arrays were fabricated by the selective adsorption of amine-terminated polydimethylsiloxane on functionalized block copolymer thin films. A polystyrene-b-poly(acrylic acid/acrylic anhydride)thin film was created by the acid-catalyzed thermal deprotection of polystyrene-b-poly(tert-butyl acrylate). The amine-terminated polydimethylsiloxane selectively adsorbed on poly(acrylic acid) (PAA)/(acrylic anhydride)(AN) spherical nanodomains using a simple dipping method. Patterned SiO_2 nanodot arrays were also fabricated using polystyrene-b-poly(tert-butyl acrylate) coated on the patterned SU-8 film. The final SiO_2 nanodot arrays were obtained by the calcination of an organosilicon film. KCI Citation Count: 1