Structural and electrical properties of Ni0.79Mn2.21-x CuxO4 thick-film bolometer with addition of copper (Cu) for application in infrared sensors

In this study, Ni0.79Mn2.21-xCuxO4 (0 ≤ x ≤ 0.15) thick films were coated on alumina substrate using a screening printingtechnique. All specimens were sintered in air at 1150 oC for 6 hr and annealed at 830 oC. We investigated structural andelectrical properties with variations of Cu amount. The res...

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Bibliographic Details
Published inJournal of Ceramic Processing Research, 17(8) pp. 890 - 893
Main Authors 이동진, 이성갑, 김경민, 한명수
Format Journal Article
LanguageEnglish
Published 세라믹연구소 01.08.2016
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Summary:In this study, Ni0.79Mn2.21-xCuxO4 (0 ≤ x ≤ 0.15) thick films were coated on alumina substrate using a screening printingtechnique. All specimens were sintered in air at 1150 oC for 6 hr and annealed at 830 oC. We investigated structural andelectrical properties with variations of Cu amount. The results from using a screening printing technique have been shown thatall specimens were in a cubic spinel phase formation without any second phase. Our study also found that the electricalresistivity at room temperature and the TCR were decreased as the Cu amount was increased. The Ni0.79Mn2.11Cu0.10O4 thickfilm showed higher electrical properties than any other Ni0.79Mn2.21-xCuxO4 thick film. The resistance at room temperature, TCR,responsivity and detectivity of Ni0.79Mn2.11Cu0.10O4 thick films were 353 Ω-cm and 3.61%/οC, 0.0212 V/W and 1.25 × 104 cmHz1/2/W, respectively. KCI Citation Count: 0
ISSN:1229-9162
2672-152X