Reactive Ion Etching Process Integration on Monocrystalline Silicon Solar Cell for Industrial Production

The reactive ion etching (RIE) technology which enables nano-texturatization of surface is applied on monocrystalline silicon solar cell. The additional RIE process on alkalized textured surface further improves the blue response and short circuit current. Such parameter is characterized by surface...

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Bibliographic Details
Published inCurrent photovoltaic research Vol. 5; no. 4; pp. 105 - 108
Main Authors Yoo, Chang Youn, Meemongkolkiat, Vichai, Hong, Keunkee, Kim, Jisun, Lee, Eunjoo, Kim, Dong Seop
Format Journal Article
LanguageKorean
Published 2017
Subjects
Reactive ion etching
Monocrystalline silicon
Surface texture
Passivation
Reflectance
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Summary:The reactive ion etching (RIE) technology which enables nano-texturatization of surface is applied on monocrystalline silicon solar cell. The additional RIE process on alkalized textured surface further improves the blue response and short circuit current. Such parameter is characterized by surface reflectance and quantum efficiency measurement. By varying the RIE process time and matching the subsequent processes, the absolute efficiency gain of 0.13% is achieved. However, the result indicates potential efficiency gain could be higher due to process integration. The critical etch process time is discussed which minimizes both front surface reflectance and etching damage, considering the challenges of required system throughput in industry.
Bibliography:KISTI1.1003/JNL.JAKO201707356125500
ISSN:2288-3274
2508-125X