Thermal Decomposition of Octanethiolate Self-Assembled Monolayers on Cu(111) in UHV

Octanethiol ($CH_3(CH_2)_7SH$) based self-assembled monolayer on Cu(111) in ultra-high vacuum has been examined using x-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), intergrated desorption mass spectrometry (IDMS), and contact angle analysis. The results show that th...

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Bibliographic Details
Published inBulletin of the Korean Chemical Society Vol. 24; no. 5; pp. 610 - 612
Main Authors Sung, Myung-M, Yun, Won-J, Lee, Sun-S, Kim, Yun-Soo
Format Journal Article
LanguageKorean
Published 2003
Subjects
Octanethiol
Cu
Self-assembled monolayers
Thermal decomposition
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Summary:Octanethiol ($CH_3(CH_2)_7SH$) based self-assembled monolayer on Cu(111) in ultra-high vacuum has been examined using x-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), intergrated desorption mass spectrometry (IDMS), and contact angle analysis. The results show that the octanethiolate monolayers similar to those on gold are formed on Cu(111). The monolayers are stable up to temperatures of about 480 K. Above 495 K the monolayers decompose via the γ-hydrogen elimination mechanism to yield 1-octene in the gas phase. The thiolate head groups on the copper surface change to Cu₂S following the decomposition of hydrocarbon fragments in the monolayers at about 605 K.
Bibliography:KISTI1.1003/JNL.JAKO200302727273632
ISSN:0253-2964
1229-5949