반응성DC마그네트론스퍼터링으로Fe3O4박막제조에관한연구
We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crysta...
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Published in | 대한금속재료학회지 Vol. 47; no. 6; pp. 378 - 382 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | Korean |
Published |
대한금속재료학회
22.06.2009
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Subjects | |
Online Access | Get full text |
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Summary: | We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe3O4 film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe3O4 film were 298 emu/cc, 4.0×10(-2) Ωcm, and 125 K, respectively. (Received February 3, 2009) |
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Bibliography: | The Korean Institute of Metals and Materials |
ISSN: | 1738-8228 |