Quaternary diborides-improving the oxidation resistance of TiB2 ± z coatings by disilicide alloying
To overcome the limited oxidation resistance of the emerging class of transition metal borides, we suggest within this study novel quaternary diborides, Ti-TM-Si-B 2 ± z (TM = Ta, Mo), achieving the compromise between excellent oxidation resistance and requirements of hard coatings. Single-phase AlB...
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Published in | Materials Research Letters Vol. 11; no. 9; pp. 733 - 741 |
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Main Authors | , , , , , , , , , , , , |
Format | Report |
Language | English |
Published |
Taylor & Francis
02.09.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To overcome the limited oxidation resistance of the emerging class of transition metal borides, we suggest within this study novel quaternary diborides, Ti-TM-Si-B
2 ± z
(TM = Ta, Mo), achieving the compromise between excellent oxidation resistance and requirements of hard coatings. Single-phase AlB
2
-type structured Ti-TM-Si-B
2 ± z
films (3-5 µm) are sputter-deposited from TiB
2
/TMSi
2
targets. The Ti-Ta-Si-B
2 ± z
coatings exhibit 36 GPa in hardness, while maintaining strongly retarded oxidation kinetics till 1000°C. Ti-Mo-Si-B
2 ± z
coatings preserve a hardness up to 27 GPa, although outperforming all their counterparts by featuring outstanding oxidation resistance with 440 nm oxide scale thickness after 1 h at 1200°C.
First report on quaternary Ti-TM-Si-B
2 ± z
coatings stabilized in hexagonal AlB
2
-prototype structures. These hard coating materials exhibit unprecedented oxidation resistance up to 1200°C due to the formation of Si-rich scales. |
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ISSN: | 2166-3831 |
DOI: | 10.1080/21663831.2023.2225554 |