Experimental Comparison of Electronic Cylotronic Resonance and Collisional Type Coaxial Plasmas Sources

• Published in: 2017 IEEE International Conference on Plasma Science (ICOPS) p. 1
• Main Authors: Lo, J., Kaiz, A., Therese, L., Caillier, B., Guillot, Ph, Latrasse, L.
• Format: Conference Proceeding
• Language: English
• Published: IEEE 01.05.2017
• ISSN: 2576-7208
• DOI: 10.1109/PLASMA.2017.8496184

Large scale industrial processes for surface treatment require uniform, dense, and quiescent plasma. One of the strategies in achieving this latter consists in distributing several microwave applicators forming a 2D or 3D network configuration 1 , which permits plasma density exceeding the critical density n_{c}defined by n_{c}=\omega _{0}^{2}m_{e}\varepsilon _{0}/e^{2}with \omega _{0}the microwave angular frequency, \varepsilon _{0}the vacuum permittivity and m_{e}the mass of the electron. Furthermore, integrating microwave applicators designed without any need of complicated matching system proved to be interesting in order to achieve fine tuning of the plasma spatial distribution, hence uniform and dense plasma over large area 2 .