Single crystal silicon (SCS) micromirror arrays using deep silicon etching and IR alignment

10/spl times/10 and 5/spl times/5, a high mirror fill factor (>70%), low voltage operation (<30 V), single crystal silicon (SCS) micromirror arrays have been designed, fabricated, and tested. Each mirror is 320 /spl mu/m by 170 /spl mu/m and is individually addressable. In comparison to thin f...

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Bibliographic Details
Published inProceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308) pp. 441 - 448
Main Authors Lee, C.S.B., Webb, R.Y., Chong, J.M., MacDonald, N.C.
Format Conference Proceeding
LanguageEnglish
Published IEEE 2000
Subjects
Aluminum
Low voltage
Micromirrors
Mirrors
Optical arrays
Optical films
Residual stresses
Silicon
Sputtering
Testing
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Summary:10/spl times/10 and 5/spl times/5, a high mirror fill factor (>70%), low voltage operation (<30 V), single crystal silicon (SCS) micromirror arrays have been designed, fabricated, and tested. Each mirror is 320 /spl mu/m by 170 /spl mu/m and is individually addressable. In comparison to thin film micro-mirror arrays, the SCS mirror surface is optically flat and smooth, free of residual stress, and highly reflective after the deposition of a thin aluminum layer. In addition to a flat mirror, high-aspect-ratio grating structures have been fabricated on the surface of the mirrors, enhancing the optical manipulation potential of devices.
ISBN:0780352734
9780780352735
ISSN:1084-6999
DOI:10.1109/MEMSYS.2000.838558