Mathematical modelling and measurement of etching profile for junction shape in MR read heads

A mathematical model was generated to predict the junction profile between MR element and hard bias element. Etching rates as a function of incident beam angle for relevant materials were experimentally determined for this model.

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Published inIEEE International Magnetics Conference p. DB04
Main Authors Won-Je Jeong, Shong, E.Y., Hahm, H.J., Min, K.-I., Young K. Kim
Format Conference Proceeding
LanguageEnglish
Published IEEE 1999
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Abstract A mathematical model was generated to predict the junction profile between MR element and hard bias element. Etching rates as a function of incident beam angle for relevant materials were experimentally determined for this model.
AbstractList A mathematical model was generated to predict the junction profile between MR element and hard bias element. Etching rates as a function of incident beam angle for relevant materials were experimentally determined for this model.
Author Young K. Kim
Min, K.-I.
Shong, E.Y.
Won-Je Jeong
Hahm, H.J.
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Snippet A mathematical model was generated to predict the junction profile between MR element and hard bias element. Etching rates as a function of incident beam angle...
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SubjectTerms Etching
Mathematical model
Shape measurement
Title Mathematical modelling and measurement of etching profile for junction shape in MR read heads
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