Deposition of carbon nitride films by laser techniques

Summary form only given. Besides the standard thin film deposition methods, laser techniques such as pulsed laser deposition (PLD) and laser-induced chemical vapor deposition (LCVD) have also been applied for synthesis of superhard carbon nitride films (CNx). The aim of the present study is to compa...

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Published inTechnical Digest. CLEO/Pacific Rim '99. Pacific Rim Conference on Lasers and Electro-Optics (Cat. No.99TH8464) Vol. 2; p. 368 vol.2
Main Authors Jelinek, M., Popov, C., Lancok, J.
Format Conference Proceeding
LanguageEnglish
Published IEEE 1999
Subjects
Chemical lasers
Laser ablation
Laser theory
Optical pulses
Power lasers
Pulse modulation
Pulsed laser deposition
Radio frequency
Substrates
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Summary:Summary form only given. Besides the standard thin film deposition methods, laser techniques such as pulsed laser deposition (PLD) and laser-induced chemical vapor deposition (LCVD) have also been applied for synthesis of superhard carbon nitride films (CNx). The aim of the present study is to compare the results for deposition rate, composition and bonding structure of CN/sub x/ films prepared by KrF excimer PLD of graphite, combined with pulse modulated RF discharge, and by laser-induced CVD by CuBr vapor laser from the system NH/sub 3//CCl/sub 4/ as well as to explain the observed differences from the viewpoint of the process mechanisms.
ISBN:9780780356610
0780356616
DOI:10.1109/CLEOPR.1999.811473