The temperature dependence of time-averaged hole drift mobility in As/sub 2/S/sub 3/ derived from PA measurements

The time-averaged hole drift mobility in As/sub 2/S/sub 3/ glass was studied in the range 77-330 K on the basis of temperature dependence of steady-state photoinduced absorption. The hole mobility was found to be thermally activated at high temperatures, of the order of 10/sup -10/ cm/sup 2//V sec a...

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Published in1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings Vol. 1; pp. 45 - 48 vol.1
Main Authors Andriesh, A.M., Culeac, I.P., Ewen, P.J.S., Owen, A.E.
Format Conference Proceeding
LanguageEnglish
Published IEEE 1997
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Summary:The time-averaged hole drift mobility in As/sub 2/S/sub 3/ glass was studied in the range 77-330 K on the basis of temperature dependence of steady-state photoinduced absorption. The hole mobility was found to be thermally activated at high temperatures, of the order of 10/sup -10/ cm/sup 2//V sec at 300 K and almost temperature independent below /spl sim/130 K.
ISBN:9780780338043
0780338049
DOI:10.1109/SMICND.1997.651545