Combination of modeling and simple real-time measurements to control plasma-surface interaction processes

The increasing complexity in industrial plasma processing demands new strategies for process control and monitoring. The energy transport mechanisms in the interface region between non-thermal low-pressure plasma and surface are of particular importance. Measurements of the "in situ" surfa...

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Bibliographic Details
Published in2012 Abstracts IEEE International Conference on Plasma Science p. 3P-110
Main Authors Greb, A., Niemi, K., O'Connell, D., Gans, T., Ennis, G. J., MacGearailt, N.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.07.2012
Subjects
Ions
Monitoring
Numerical models
Plasma measurements
Plasmas
Process control
Surface treatment
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Summary:The increasing complexity in industrial plasma processing demands new strategies for process control and monitoring. The energy transport mechanisms in the interface region between non-thermal low-pressure plasma and surface are of particular importance. Measurements of the "in situ" surface condition, which strongly affects the plasma-surface interaction processes, are extremely challenging. The most promising approach for advanced process monitoring is the active coupling of semi-kinetic simulations and diagnostics.
ISBN:9781457721274
1457721279
ISSN:0730-9244
2576-7208
DOI:10.1109/PLASMA.2012.6383895