Study of dry etching process using SF6 and CF4/O2 for Nb/NbxSi1−x/Nb Josephson-junction fabrication
Both SF 6 and CF 4 are plasma chemistries that are often used during dry etching in fabricating the niobium Josephson junctions. This paper presents the preliminary experimental results of using these two etches on etching Nb/Nb x Si 1-x /Nb Josephson junctions in NIM.
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Published in | 2012 Conference on Precision electromagnetic Measurements pp. 46 - 47 |
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Main Authors | , , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
01.07.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Both SF 6 and CF 4 are plasma chemistries that are often used during dry etching in fabricating the niobium Josephson junctions. This paper presents the preliminary experimental results of using these two etches on etching Nb/Nb x Si 1-x /Nb Josephson junctions in NIM. |
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ISBN: | 1467304395 9781467304399 |
ISSN: | 0589-1485 2160-0171 |
DOI: | 10.1109/CPEM.2012.6250653 |