Microsecond plasma opening switch application for materials processing
Summary form only given. A novel approach to microsecond plasma opening switch (MPOS) application for a pulse power ion beam (PPIB) source is discussed. Characterization of the PPIB in the MPOS was made on a microsecond MARX generator (500 kV, 280 kA, 1 /spl mu/s) in both positive and negative polar...
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Published in | International Conference on Plasma Sciences (ICOPS) p. 159 |
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Main Authors | , , , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
1993
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Subjects | |
Online Access | Get full text |
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Summary: | Summary form only given. A novel approach to microsecond plasma opening switch (MPOS) application for a pulse power ion beam (PPIB) source is discussed. Characterization of the PPIB in the MPOS was made on a microsecond MARX generator (500 kV, 280 kA, 1 /spl mu/s) in both positive and negative polarities of the potential electrode. The ion-irradiated region at the MPOS cathode had a length of several tens of centimeters, significantly exceeding the initial plasma length. The ion flow current distribution along the switch was nonuniform with the maximum (up to 100 A/cm/sup 2/) at the load side of the plasma source. The ion flow at the load side of the switch consisted mostly of hydrogen ions, while in the near generator region C/sup +/ ions were dominant. The overall generation efficiency of the PPIB amounted to 30-50%. |
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ISBN: | 0780313607 9780780313606 |
ISSN: | 0730-9244 2576-7208 |
DOI: | 10.1109/PLASMA.1993.593453 |