Microsecond plasma opening switch application for materials processing

Summary form only given. A novel approach to microsecond plasma opening switch (MPOS) application for a pulse power ion beam (PPIB) source is discussed. Characterization of the PPIB in the MPOS was made on a microsecond MARX generator (500 kV, 280 kA, 1 /spl mu/s) in both positive and negative polar...

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Published inInternational Conference on Plasma Sciences (ICOPS) p. 159
Main Authors Bystritskii, V.M., Grigoriev, S.V., Lisitsyn, I.V., Mesyats, G.A., Sinebryukhov, A.A., Sinebryukhov, V.A.
Format Conference Proceeding
LanguageEnglish
Published IEEE 1993
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Summary:Summary form only given. A novel approach to microsecond plasma opening switch (MPOS) application for a pulse power ion beam (PPIB) source is discussed. Characterization of the PPIB in the MPOS was made on a microsecond MARX generator (500 kV, 280 kA, 1 /spl mu/s) in both positive and negative polarities of the potential electrode. The ion-irradiated region at the MPOS cathode had a length of several tens of centimeters, significantly exceeding the initial plasma length. The ion flow current distribution along the switch was nonuniform with the maximum (up to 100 A/cm/sup 2/) at the load side of the plasma source. The ion flow at the load side of the switch consisted mostly of hydrogen ions, while in the near generator region C/sup +/ ions were dominant. The overall generation efficiency of the PPIB amounted to 30-50%.
ISBN:0780313607
9780780313606
ISSN:0730-9244
2576-7208
DOI:10.1109/PLASMA.1993.593453