The principle of a new thermometer in HF CVD reactor

The topic of the submitted article is the issue of measuring the temperature in a hot filament chemical vapour deposition (HF CVD) reactor by a purpose-built electronic circuit. The topical objective is to optimize the substrate temperature, one of the key technological parameters in the synthesis o...

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Bibliographic Details
Published in2009 32nd International Spring Seminar on Electronics Technology pp. 1 - 4
Main Authors Kadlecikova, M., Kolmacka, M., Lazistan, F., Breza, J., Jesenak, K., Pastorkova, K., Durackova, D.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.05.2009
Subjects
Calibration
Carbon nanotubes
Chemical reactors
Chemical technology
Chemical vapor deposition
Circuit synthesis
Electronic circuits
Hafnium
Inductors
Temperature measurement
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Summary:The topic of the submitted article is the issue of measuring the temperature in a hot filament chemical vapour deposition (HF CVD) reactor by a purpose-built electronic circuit. The topical objective is to optimize the substrate temperature, one of the key technological parameters in the synthesis of carbon nanotubes. Design and construction of a functional thermometer and its calibration and, hereby, improved accuracy of temperature measurement is the main outcome of this experimental work.
ISBN:9781424442607
1424442605
ISSN:2161-2528
DOI:10.1109/ISSE.2009.5206957