Sputtered A1N Thin Films for Piezoelectric MEMS Devices

Piezoelectric films have been demonstrated to be attractive for micromechanical systems (MEMS) devices. Among the piezoelectric films used, AlN film has been less explored. In this study, AlN resonators and accelerometers, utilizing longitudinal and transverse piezoelectric effects respectively, wer...

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Published in2006 5th IEEE Conference on Sensors pp. 10 - 13
Main Authors Wang, Li-Peng, Ginsburg, Eyal, Gerfers, Friedel, Samara-Rubio, Dean, Weinfeld, Boaz, Ma, Qing, Rao, Valluri, He, Ming Yuan
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2006
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Abstract Piezoelectric films have been demonstrated to be attractive for micromechanical systems (MEMS) devices. Among the piezoelectric films used, AlN film has been less explored. In this study, AlN resonators and accelerometers, utilizing longitudinal and transverse piezoelectric effects respectively, were demonstrated. Resonators with Q of 1000 and electromechanical coupling (k t 2 ) of 6.5% were achieved at ~2 GHz. Accelerometers were fabricated and tested with charge sensitivities ranging between 0.06 to 0.45 pC/g depending on device designs. Important material properties of sputtered AlN films - C 33 of 435 GPa, e 33 of 1.55 C/m 2 , and e 31 of -0.58 C/m 2 - were extracted by fitting finite element analysis (FEA) simulated values to measured results.
AbstractList Piezoelectric films have been demonstrated to be attractive for micromechanical systems (MEMS) devices. Among the piezoelectric films used, AlN film has been less explored. In this study, AlN resonators and accelerometers, utilizing longitudinal and transverse piezoelectric effects respectively, were demonstrated. Resonators with Q of 1000 and electromechanical coupling (k t 2 ) of 6.5% were achieved at ~2 GHz. Accelerometers were fabricated and tested with charge sensitivities ranging between 0.06 to 0.45 pC/g depending on device designs. Important material properties of sputtered AlN films - C 33 of 435 GPa, e 33 of 1.55 C/m 2 , and e 31 of -0.58 C/m 2 - were extracted by fitting finite element analysis (FEA) simulated values to measured results.
Author Wang, Li-Peng
Ginsburg, Eyal
He, Ming Yuan
Samara-Rubio, Dean
Ma, Qing
Gerfers, Friedel
Weinfeld, Boaz
Rao, Valluri
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  organization: Microsystems Technology, Intel Corporation, Santa Clara, California, USA
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  givenname: Ming Yuan
  surname: He
  fullname: He, Ming Yuan
  organization: Materials Department, University of California, Santa Barbara, California, USA
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Snippet Piezoelectric films have been demonstrated to be attractive for micromechanical systems (MEMS) devices. Among the piezoelectric films used, AlN film has been...
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StartPage 10
SubjectTerms Accelerometers
Material properties
Microelectromechanical devices
Micromechanical devices
Piezoelectric devices
Piezoelectric effect
Piezoelectric films
Sputtering
Testing
Thin film devices
Title Sputtered A1N Thin Films for Piezoelectric MEMS Devices
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