Microwave AlxGa1-xAs hetero-MIS gate depletion-mode InP field effect transistors
Depletion-mode InP FET's were successfully fabricated by employing MBE-grown undoped Al x Ga 1-x AS (x=0.0 and 0.3) layers as a gate insulator. The fabricated 1 µm gate InP FET's with an ion-implanted n-channel exhibited good and stable depletion-mode characteristics and microwave performa...
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Published in | 1986 International Electron Devices Meeting pp. 771 - 774 |
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Main Authors | , , , |
Format | Conference Proceeding |
Language | English |
Published |
IRE
1986
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Abstract | Depletion-mode InP FET's were successfully fabricated by employing MBE-grown undoped Al x Ga 1-x AS (x=0.0 and 0.3) layers as a gate insulator. The fabricated 1 µm gate InP FET's with an ion-implanted n-channel exhibited good and stable depletion-mode characteristics and microwave performance. 8.3 dB maximum power gain was obtained for a GaAs gate InP FET at 12 GHz, and more than 7 dB power gain was obtained for both GaAs and Al 0.3 Ga 0.7 As gate InP FET's. |
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AbstractList | Depletion-mode InP FET's were successfully fabricated by employing MBE-grown undoped Al x Ga 1-x AS (x=0.0 and 0.3) layers as a gate insulator. The fabricated 1 µm gate InP FET's with an ion-implanted n-channel exhibited good and stable depletion-mode characteristics and microwave performance. 8.3 dB maximum power gain was obtained for a GaAs gate InP FET at 12 GHz, and more than 7 dB power gain was obtained for both GaAs and Al 0.3 Ga 0.7 As gate InP FET's. |
Author | Itoh, T. Ozawa, T. Kasahara, K. Ohata, K. |
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Snippet | Depletion-mode InP FET's were successfully fabricated by employing MBE-grown undoped Al x Ga 1-x AS (x=0.0 and 0.3) layers as a gate insulator. The fabricated... |
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StartPage | 771 |
SubjectTerms | Current-voltage characteristics Etching Fabrication Gallium arsenide Gold Indium phosphide Microwave FETs Molecular beam epitaxial growth Thermal conductivity Voltage |
Title | Microwave AlxGa1-xAs hetero-MIS gate depletion-mode InP field effect transistors |
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