A high gain L-band GaAs FET technology for 28 V operation

This paper describes a successfully developed L-band FET for 28 V operation. The FET structure was adequately designed to realize breakdown voltage of 84 V and a gradual doping channel was adopted to improve the linearity. The FET realizes record operation voltage up to 42 V. The FET also exhibits p...

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Bibliographic Details
Published in2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535) Vol. 2; pp. 821 - 824 Vol.2
Main Authors Inoue, K., Nagahara, M., Ui, N., Haematsu, H., Sano, S., Fukaya, J.
Format Conference Proceeding
LanguageEnglish
Published IEEE 2004
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Summary:This paper describes a successfully developed L-band FET for 28 V operation. The FET structure was adequately designed to realize breakdown voltage of 84 V and a gradual doping channel was adopted to improve the linearity. The FET realizes record operation voltage up to 42 V. The FET also exhibits power density of 1.05 W/mm, linear gain of 17.2 dB and IM3 of -33 dBc. A strait IM3 profile is obtained and so-called "plateau" profile is extinct. In addition, the estimated MTTF at Tch of 145/spl deg/C is longer than 4/spl times/10/sup 6/ hours.
ISBN:0780383311
9780780383319
ISSN:0149-645X
2576-7216
DOI:10.1109/MWSYM.2004.1339091