Incremental Plasma Etching and Depletion of Metal Mask for Generating ARSS on Fused Silica Optical Windows

This study explores transmission enhancement and limitations for fabrication of anti-reflective structured surfaces (ARSS) by plasma etching gold nanoparticle mask on silica substrates. Etching time and depth were incremented to witness evolution of ARSS production.

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Bibliographic Details
Published in2024 Conference on Lasers and Electro-Optics (CLEO) pp. 1 - 2
Main Authors Vaca, Benjamin A., Yoshino, Jude K., Genet, William E., Benge, Tyler A., Aggarwal, Ishwar D., Hutchens, Thomas C.
Format Conference Proceeding
LanguageEnglish
Published Optica 05.05.2024
Subjects
Electro-optic effects
Etching
Gold
Optical device fabrication
Plasmas
Production
Substrates
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Summary:This study explores transmission enhancement and limitations for fabrication of anti-reflective structured surfaces (ARSS) by plasma etching gold nanoparticle mask on silica substrates. Etching time and depth were incremented to witness evolution of ARSS production.